Vol. 3 No 2 was published on June 18, 2019. | Clarivate Analytics | Control Committee in Education and Science of the Republic of Kazakhstan |


Optimization of deposition parameters for thin film lithium phosphorus oxynitride (LIPON)

Number 2_Vol.3

AUTHORS: B. Uzakbaiuly, A. Mukanova, I. Kurmanbayeva, Z.B. Bakenov

DOI: 10.29317/ejpfm.2019030209

PAGES: 174 - 182

DATE: 2019-06-18


ABSTRACT

Thin film of lithium phosphorus oxynitride (LIPON) was successfully deposited by radio frequency (RF) magnetron sputtering technique using a Li3PO4 target. The optimal deposition parameters were determined for the thin films with the highest target-substrate distance. Characterization of deposited film was carried out by AFM, FTIR and Raman spectroscopy, which showed incorporation of nitrogen into the film as both doubly, Nd, and possibly triply, Nt, coordinated form. The ac impedance spectroscopy measurements revealed that the highest ionic conductivity of 1.1 μScm−1 was achieved at room temperature for the samples prepared at the optimum RF power and gas flow conditions.


KEYWORDS

thin film, LIPON, RF sputtering, PVD.


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