Rysbaev A, Irgashev SU, Kasimov AS, et al. Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides. Eur. J. Phys. Funct. Mater. 2026;4(1). Accessed March 10, 2026. https://ephys.kz/index.php/journal/article/view/152