Rysbaev, A., Irgashev, S. U., Kasimov, A. S., Juraeva, D. S., Khujaniyazov, J. B., Khujaniyazov, J., & Khudoyberdieva, M. (2026). Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides. Eurasian Journal of Physics and Functional Materials, 4(1). https://ephys.kz/index.php/journal/article/view/152