RYSBAEV, A; IRGASHEV, S. U.; KASIMOV, A. S.; JURAEVA, D. Sh.; KHUJANIYAZOV, J. B.; KHUJANIYAZOV, J.B.; KHUDOYBERDIEVA, M.I. Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides. Eurasian Journal of Physics and Functional Materials, [S. l.], v. 4, n. 1, 2026. Disponível em: https://ephys.kz/index.php/journal/article/view/152. Acesso em: 10 mar. 2026.